Our client is one of the world's leading manufacturers of lithography equipment and a majority of the world's microchips receive their critical lithographic patterning in their machines. In addition they also produce metrology tools and advanced applications to analyze and optimize the performance of the production process. In their applications department they develop analytics & control solutions that improve the accuracy of performance metrics (such as overlay, focus, critical dimension) as measured on the end product of a fab process (wafers with chip structures).
In this project you will work on the platform that analyzes the measurement data and calculates required corrections that are sent back into the lithography machines.
The team will have Luxoft and client members at first, aiming for it to become completely owned by Luxoft during 2022. It will consist of a team lead, 3 developers, an automated QA engineer and a functional test engineer. A SM and a PO will contribute as well. Most likely it will be an international distributed team.
Business trips to the client site in the Netherlands are possible after the restrictions are lifted.
Participate in new features development.
Participate in testing activities: unit, functional, regression, API testing etc.
Participate in design sessions & contributing to documentation.
Development is mostly for new features.
Development is mostly for back-end side.
6+ years of Java development experience
Extensive experience with application servers (Wildfly/JBoss), microservice architecture
Experience with security & code obfuscation
Experience with multithreading & multiprocessing.
Experience with profiling & memory complexity (memory optimization techniques, lazy loading, peak usage, performance tuning for algorithms, experience with a profiler app etc.)
Good knowledge of Garbage Collection
Experience with software design/architecture
Experience with different testing levels (unit, integration, regression etc.)
Nice to have
Knowledge of SDLC
AGILE way of working - Scrum, BDD etc.
Mathematical background is a plus
Initiative to address project pitfalls and targets.
Autonomy for problem-solving, acting as a driver
Interest to gain domain knowledge (IC Lithography and Metrology processes).
Ability to think in abstractions: system design, defensive programming, how to deliver a robust/scalable solution
English: B2 Upper Intermediate
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